Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

Mat-Teridi, M.A.; Tahir, Asif Ali; Senthilarasu, S.; Wijayantha, K.G.U.; Sulaiman, M.Y.; Ahmad-Ludin, N.; Ibrahim, M.A.; Sopian, K.

Abstract

Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.

Citation

Mat-Teridi, M., Tahir, A. A., Senthilarasu, S., Wijayantha, K., Sulaiman, M., Ahmad-Ludin, N., …Sopian, K. (2014). Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD). physica status solidi (RRL) - Rapid Research Letters, 8(12), 982-986. https://doi.org/10.1002/pssr.201409056

• Journal Article Type: Article
• Acceptance Date: Apr 21, 2014
• Online Publication Date: Apr 28, 2014
• Publication Date: Dec 15, 2014
• Deposit Date: Mar 14, 2023
• Print ISSN: 1862-6254
• Publisher: Wiley
• Peer Reviewed: Peer Reviewed
• Volume: 8
• Issue: 12
• Pages: 982-986
• DOI: https://doi.org/10.1002/pssr.201409056
• Keywords: NiO, aerosol-assisted chemical vapour deposition, photoelectrochemical water splitting