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Fabrication of NiO photoelectrodes by aerosol-assisted chemical vapour deposition (AACVD)

Mat-Teridi, M.A.; Tahir, Asif Ali; Senthilarasu, S.; Wijayantha, K.G.U.; Sulaiman, M.Y.; Ahmad-Ludin, N.; Ibrahim, M.A.; Sopian, K.

Authors

M.A. Mat-Teridi

Asif Ali Tahir

K.G.U. Wijayantha

M.Y. Sulaiman

N. Ahmad-Ludin

M.A. Ibrahim

K. Sopian



Abstract

Nanostructured nickel oxide (NiO) photoelectrodes were fabricated with controlled morphology and texture using single-step aerosol-assisted chemical vapour deposition (AACVD). The durable one-step film fabrication process resulted in highly crystalline columnar structure. Texture controlled films were also fabricated from granular to crystalline columnar morphology by controlling the deposition temperature. The thin film electrodes are highly reproducible and possess an optical bandgap of ∼3.7 eV and exhibit cathodic photocurrent.

Journal Article Type Article
Acceptance Date Apr 21, 2014
Online Publication Date Apr 28, 2014
Publication Date Dec 15, 2014
Deposit Date Mar 14, 2023
Print ISSN 1862-6254
Publisher Wiley
Peer Reviewed Peer Reviewed
Volume 8
Issue 12
Pages 982-986
DOI https://doi.org/10.1002/pssr.201409056
Keywords NiO, aerosol-assisted chemical vapour deposition, photoelectrochemical water splitting